Dr. Benedikt Haas entwickelt und wendet hochauflösende Elektronenmikroskopie-Techniken an, um atomare Vibrationen in Materialien direkt zu messen und zu modellieren. Sein aktueller Fokus liegt auf der Kombination von Elektronenptychographie und Spektroskopie, um räumlich korrelierte Atomschwingungen bei Raumtemperatur sichtbar zu machen – etwa an Korngrenzen oder in zweidimensionalen Materialien wie Bornitrid. Diese Methoden ermöglichen es, Defekte, Phasenübergänge und elektronisch-vibronische Kopplungen in Nanostrukturen zu verstehen, was für die Entwicklung von Nanomaterialien, Quantensenoren und funktionalen Heterostrukturen relevant ist. Die Arbeiten verbinden experimentelle Instrumentenentwicklung mit rechnergestützter Bildrekonstruktion und theoretischer Modellierung.
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Dr. Benedikt Haas
HU-FIS-Profil ↗Pumpen, Messen und Modellieren atomarer Vibrationen im Elektronenmikroskop
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SFB 1772/1: Struktur und kollektive Anregungen in mol2Dmat-Heterostrukturen durch schnelle Elektronen (TP A05)
university
Pumpen, Messen und Modellieren atomarer Vibrationen im Elektronenmikroskop
university
Förderer: DFG Sachbeihilfe Internationale Kooperation Zeitraum: 06/2024 - 06/2027 Projektleitung: Dr. Benedikt Haas
Förderer: DFG Sonderforschungsbereich Zeitraum: 10/2025 - 06/2029 Projektleitung: Prof. Christoph T. Koch, PhD, Dr. Benedikt Haas
Förderer: DFG Sachbeihilfe Internationale Kooperation Zeitraum: 06/2024 - 06/2027 Projektleitung: Dr. Benedikt Haas
ACS Nano · DOI
Controlled substitutional doping of two-dimensional transition-metal dichalcogenides (TMDs) is of fundamental importance for their applications in electronics and optoelectronics. However, achieving p-type conductivity in MoS2 and WS2 is challenging because of their natural tendency to form n-type vacancy defects. Here, we report versatile growth of p-type monolayer WS2 by liquid-phase mixing of a host tungsten source and niobium dopant. We show that crystallites of WS2 with different concentrations of substitutionally doped Nb up to 1014 cm–2 can be grown by reacting solution-deposited precursor film with sulfur vapor at 850 °C, reflecting the good miscibility of the precursors in the liquid phase. Atomic-resolution characterization with aberration-corrected scanning transmission electron microscopy reveals that the Nb concentration along the outer edge region of the flakes increases consistently with the molar concentration of Nb in the precursor solution. We further demonstrate that ambipolar field-effect transistors can be fabricated based on Nb-doped monolayer WS2.
Journal of Applied Physics · DOI
This work presents the first atomic scale evidence for ferroelectric polarization inversion on the unit cell level in a wurtzite-type material based on epitaxial Al0.75Sc0.25N thin films. The electric field induced formation of Al-polar inversion domains in the originally N-polar film is unambiguously determined by atomic resolution imaging using aberration-corrected scanning transmission electron microscopy (STEM). Anisotropic etching supports STEM results confirming a complete and homogenous polarization inversion at the film surface for the switched regions and the virtual absence of previous inversion domains in as-deposited regions. Local evidence of residual N-polar domains at the bottom electrode interface is observed and can be explained by both stress gradients and electric field deflection. The epitaxial relationship of the sapphire/AlN/Mo/AlScN multilayer stack is discussed in detail. Selected-area electron diffraction experiments and XRD pole figures reveal a Pitsch–Schrader type orientation relation between the Mo electrode and the AlScN film.
Advanced Functional Materials · DOI
Abstract The recent emergence of wurtzite‐type nitride ferroelectrics such as Al 1‐ x Sc x N has paved the way for the introduction of all‐epitaxial, all‐wurtzite‐type ferroelectric III‐N semiconductor heterostructures. This paper presents the first in‐depth structural and electrical characterization of such an epitaxial heterostructure by investigating sputter deposited Al 1‐ x Sc x N solid solutions with x between 0.19 and 0.28 grown over doped n‐GaN. The results of detailed structural investigations on the strain state and the initial unit‐cell polarity with the peculiarities observed in the ferroelectric response are correlated. Among these, a Sc‐content dependent splitting of the ferroelectric displacement current into separate peaks, which can be correlated with the presence of multiple strain states in the Al 1‐ x Sc x N films is discussed. Unlike in previously reported studies on ferroelectric Al 1‐ x Sc x N, all films thicker than 30 nm grown on the metal (M)‐polar GaN template feature an initial multidomain state. The results support that regions with opposed polarities in as‐grown films do not result as a direct consequence of the in‐plane strain distribution, but are rather mediated by the competition between M‐polar epitaxial growth on an M‐polar template and a deposition process that favors nitrogen (N)‐polar growth.